EBS-530 Electron Beam Sweep Controller

제품 특징

• EBS-530 Electron Beam Sweep Controller generates a large number of precision sweep patterns for use with electron beam (e-beam) deposition sources. The user may select from the basic shapes provided(circle, figure-8, line and point), or create user-defined patterns to optimize deposition control of metals and dielectric materials. Variations on the basic shapes can be created by applying the provided pattern modifiers. Pattern modifiers provided include power, sweep frequency, rotational speed and power profile.
• Operation and programming is easy through the user-friendly touch screen LCD display. EBS-530 can store up to 32 different sweep patterns. Sweep patterns can easily be selected from the front panel, through remote input, or through the standard RS-232/RS-485 interface.
• Starting with a fixed set of basic sweep patterns that are embedded in the Sweep Control, the user can design e-beam sweep patterns that are ideally suited to the characteristics of the source and deposition materials. The sweep patterns generated by EBS-530 produce dual current outputs which can drive the X and Y sweep coils of most electron beam deposition sources.
• EBS-530 features a calibration function to compensate for differences between types and brands of e-beam guns and provides optimum heating of the deposition material.