Evaporator
E-Beam Evaporation System
제품 특징
- Film Deposition
- Process : Multi-layer films deposition
- Deposition material : Al, Ti, Ta, Ni, Au, Pt
- Substrate size : 4''~12'' diameter
- Purpose : Research and development
제품 자료
다운로드 가능한 자료가 없습니다.
제품 상세 정보
| 항목 | 값 |
|---|---|
| connector | No |
| managed | No |
| overview order | 1 |
| product order | 1 |
| product spec | Performance
● Base Pressure : 1 X 10^(-7)Torr ● Throughput : 1 pcs/batch ● Thickness uniformity : ±3% ● Jig rotation speed : 0~30rpm ● Substrate temperature : Max. 350°C ● Substrate temperature uniformity : ±3.0% ● Manual operation Deposition Control ● E-Beam Evaporation : 6 X 25cc crucible, 15kw ● Precleaning by glow discharge(self-bias) ● Metal film : by quartz oscharge(self-bias) ● E-beam gun control : user programmable by thickness monitor ● Heating element : IR lamp heater ● Temperature control : PID control |
| quantity | 0 |
| reg date | 2017-02-27 11:17:02 |
| single | No |